Shanghai Deborn Co., Ltd. tau ua lag luam hauv cov tshuaj additives txij li xyoo 2013, lub tuam txhab nyob hauv Pudong New District ntawm Shanghai.
Deborn ua haujlwm los muab cov tshuaj lom neeg thiab cov kev daws teeb meem rau cov ntaub, yas, tshuaj pleev xim, xim pleev xim, khoom siv hluav taws xob, tshuaj, kev lag luam hauv tsev thiab kev saib xyuas tus kheej.
Nws muaj kev tiv thaiv UV zoo heev thiab ruaj khov kub zoo, ua ke ua rau nws muaj txiaj ntsig zoo rau ntau cov thermoplastic resins. Etocrylene pab txo cov xim rau cov txheej thiab cov yas dua li ntau lwm cov UV stabilizers.
Haum rau kev ua kom ci ntsa iab paj rwb lossis ntaub nylon nrog cov txheej txheem dyeing pa tawm hauv chav tsev kub, muaj lub zog loj ntawm kev ua kom dawb dua, tuaj yeem ua tiav qhov dawb siab dua.
Kev kho qhov muagCov tshuaj ua kom ci ntsa iab CBS-X yog siv dav hauv kev lag luam ntxuav khaub ncaws, xab npum thiab tshuaj pleev ib ce thiab lwm yam. Nws kuj tseem siv rau hauv kev lag luam textile. Nws yog tus neeg ua kom dawb zoo tshaj plaws rau cov hmoov ntxhua khaub ncaws, tshuaj pleev khaub ncaws thiab cov tshuaj ntxuav kua. Nws yooj yim rau kev puas tsuaj ntawm cov kab mob thiab yooj yim yaj hauv dej, txawm tias nyob rau hauv qhov kub qis, tshwj xeeb tshaj yog haum rau cov tshuaj ntxuav kua. Cov khoom zoo sib xws ua nyob rau hauv txawv teb chaws suav nrog, Tinopal CBS-X, thiab lwm yam.
Ntxiv AMS-X rau cov hmoov ntxhua khaub ncaws ua ntej txau kom qhuav, AMS-X tuaj yeem sib xyaw nrog cov hmoov ntxhua khaub ncaws los ntawm kev txau kom qhuav.
MGDA-Na3 siv tau rau ntau yam teb. Nws muaj kev nyab xeeb zoo heev thiab muaj biodegradability ruaj khov. Nws tuaj yeem chelate cov hlau ions los tsim cov tshuaj ruaj khov.
GLDA-NA4 feem ntau yog ua los ntawm cov khoom siv raw los ntawm tsob ntoo, L-glutamate. Nws yog ib qho khoom siv uas tsis ua rau ib puag ncig puas tsuaj, muaj kev nyab xeeb thiab txhim khu kev qha hauv kev siv, yooj yim lwj.
EDTA-4Na yog ib qho tseem ceeb chelant ntawm cov hlau ion. Nws yog siv los ua additive, activator, dej huv agent thiab cov hlau ion masking composition rau kev ntxuav kev lag luam, polyreaction, watertreatment, xim photosensitive thiab kev lag luam ntawv.
EDTA-2Na siv rau hauv cov tshuaj ntxuav tes, xab npum ua kua, tshuaj zawv plaub hau, tshuaj ua liaj ua teb, tshuaj kho rau kev tsim cov xim zaj duab xis, tshuaj ntxuav dej, PH modifier. Thaum hais txog qhov tshuaj tiv thaiv redox rau polymerization ntawm butyl benzene roj hmab, nws yog siv ua ib feem ntawm activator rau kev sib xyaw ntawm cov hlau ion thiab tswj kev ceev polymerization.
Ua tus neeg sawv cev chelating, EDTA Acid tuaj yeem siv dav hauv cov neeg sawv cev kho dej, cov tshuaj ntxuav tes, cov tshuaj teeb pom kev zoo, cov tshuaj ntawv, cov tshuaj roj hauv av, cov neeg sawv cev ntxuav boiler thiab cov tshuaj analytical.
Qhov tsos:Dawb rau cov siv lead ua qab zib
Tsw tsw:Cov ntxhiab tsw ntawm phenolic
Kev dawb huv:99% Min
Tetrachloroethylene: 0.1% Max
Kev Tsis Huv MX（3, 5-Xylenol): 0.5% Max
Kev Tsis Huv OCMX（2-chloro-3,5-Xylenol):0.3% Max
Kev Tsis Huv DCMX (2,4-Dichloro-3,5-dimethylphenol): 0.3% Max
Hlau: 50ppm Max
Tooj liab: 50ppm Max
Cov seem ntawm kev kub hnyiab: 0.1% Max
Dej: 0.5% Max
Meiting Point Range℃:114-116
Kev meej: Kev daws teeb meem meej
Cov tshuaj pleev xim uas ua raws li txoj cai, cov ntaub ntawv siv hauv tsev, hluav taws xob fais fab metallurgy, roj teb chemical engineering, tawv, xim txheej thiab spinning prints rau zas xim, hnub tig, antisepsis ntawm cov tshuaj pleev ib ce, deckle, cov dej lag luam thiab lwm yam realm.
Elubiol siv tau rau cov khoom tiv thaiv kab mob fungal, cov khoom siv ntxuav plaub hau, cov khoom tswj roj hauv cov khoom siv saib xyuas tus kheej.
